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  • Axcelis | Ion Implantation | Purion Ion Implanters
    Axcelis Ion implantation systems, built on our next-gen Purion platform, delivers precision, purity, and productivity with the lowest cost of ownership
  • Ion Implantation in Silicon Technology - Axcelis
    A modern ion implanter costs about $2–5 million, depending on the model and the wafer size it processes Of the three classes of implanters, the high-current machines have traditionally been the biggest market in terms of rev-enue and unit volume Revenue is increasing faster than unit volume because implanters have become more expen-sive
  • Axcelis | 離子植入 | Purion 離子植入機
    Axcelis 離子植入系統，建立於我們新一代的 Purion 平台上，提供精密、純度和生產力及最低的生產成本。
  • Ion Implantation Equipment | View Purion Product Line - Axcelis
    Purion ion implantation equipment delivers the highest purity, precision and productivity at the lowest cost of ownership View the full Purion product line
  • Purion XE Series | High Energy Ion Implantation | Axcelis
    The Axcelis Purion XE Series is the industry standard for demanding high energy ion implantation, offering a wider energy range and greater reliability
  • GSD Ovation | High Current High Energy Batch Ion Implanters
    The GSD platform is the industry benchmark for the longest manufactured and supported batch ion implanter The Ovation™ is the latest batch configuration designed to seamlessly integrate with the existing fleet of Axcelis batch implanters, while providing incremental performance improvements with updated components for long-term sustainability The Ovation extends the GSD series platform’s
  • Beam Energy Purity on Axcelis XE High Energy Ion Implanter
    On Purion XE, the magnetic energy filter removes the low intensity low energy ions which somehow survive the velocity filter by RF linac On a tandem accelerator based high energy implanter, the energy filter is often called as charge filter and plays more active role in choosing a desired beam out of multiplicity of peaks
  • Introducing the Purion H200 single wafer high current implanter
    Axcelis Technologies has launched the first single-wafer implanter called the PurionTM H200 that delivers the pro-ductivity of a high-current tool with the precision, accu-racy, and energy range of a medium-current tool This paper describes the capabilities of this implanter that has already been qualified in high-volume manufacturing fabs at lead-ing power device companies for both Silicon
  • Purion H | 大束流离子注入 | Axcelis
    Purion Contamination Shield™ 实现独特的扫描点状离子束结构。Purion 大束流平台采用了五层过滤离子束路径设计，包括一台经过现场验证的能量过滤器，以达到极高纯度。每个机台均配置专利型无灯丝微波等离子体电子流 (PEF)，实现晶圆电荷中和，无额外金属污染。
  • Dual Cathode Ion Source for Axcelis’ High Energy Implanters
    Dual Cathode Ion Source for Axcelis’ High Energy Implanters Wilhelm Platow, Neil Bassom, Paul Silverstein, Ron Lessard, Paul Whalen, Russ Newman





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